产品介绍

• Overview of KRC-NTC-HfO2                                                                                                                                                                                               

• The Nano Thickness Calibrators (NTC) for the thickness measurement of nm oxide films are CRMs for the calibration of thickness measurement equipment, such as, XRR, XPS, Ellipsometry, TEM, MEIS, etc..
• The KRC-NTC-HfO2 [HfO2(5-25 nm)/SiO2(2 nm)/Si(100)] is composed of 5 thin HfO2 films grown by atomic layer deposition on Si(100) wafers with a surface SiO2 layer of about 2 nm, grown by thermal oxidation.
• They can be used to calibrate the parameters for the thickness measurement of nm HfO2 films through certified values.

• Specifications of KRC-NTC-HfO2

• Item	Detailed Specifications
  Nominal thickness	5, 10, 15, 20, 25 nm
  Substrate	SiO2(2 nm) / Si(100) wafer
  Film deposition	Atomic Layer Deposition
  Certification method	Mutual calibration with TEM and MEIS
  Traceability	Silicon lattice constant measured by TEM

• MEIS Spectrum

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